Corrosion behavior of aluminum oxide coatings created by electrolytic plasma method under different potential regimes

Mahsa Amiri; Vahid Tavakoli Targhi; Saman Padervand; Seyed  Mohammad  Mousavi Khoei

doi:10.29252/jcc.2.3.4

Authors

Mahsa Amiri Material and Metallurgical Engineering Department, Amirkabir University of Technology, Hafez Street, Tehran, Iran
Vahid Tavakoli Targhi Material and Metallurgical Engineering Department, Amirkabir University of Technology, Hafez Street, Tehran, Iran
Saman Padervand Material and Metallurgical Engineering Department, Amirkabir University of Technology, Hafez Street, Tehran, Iran
Seyed Mohammad Mousavi Khoei Material and Metallurgical Engineering Department, Amirkabir University of Technology, Hafez Street, Tehran, Iran

DOI:

https://doi.org/10.29252/jcc.2.3.4

Keywords:

Plasma electrolytic oxidation, Aluminum oxide coatings, Potential regime, Corrosion

Abstract

The electrolytic plasma coating is affected by various factors such as electrolyte conductivity, voltage, and current. However, there has not been much attention to the effect of the current regime. The main objective of the present study is to investigate the potential of Al₂O₃ coatings deposited by the electrolytic plasma method. Aluminum Series 2 was used in this study and the electrolyte was composed of sodium silicate, sodium tetraphosphate, sodium aluminate and potassium hydroxide. The results showed that, in general, according to the impedance diagrams, the corrosion resistance of the coated specimens greatly increases with the immersion time. Therefore, the unit of resistance increased on average to about 10 MHz after 72 hours. In the case of pulsed potential application regime, the corrosion behavior of the samples in the working cycle of 30% was better than that of 70%, which can be related to the thickness of the formed coatings and their porosity. This allows the coating to degrade the coating faster by increasing the thickness and decreasing the porosity of the aggressive chloride ion.

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Article DOR: 20.1001.1.26765837.2020.2.4.4.6